Chemical vapor deposition trap with tapered inlet

A trap filter chamber (16) removes chemical by-products created during the manufacturing process of semiconductor wafers in a low pressure chemical vapor deposition reactor (12). A vapor containing the process by-products is discharged from the reactor to the trap chamber (16) by way of connecting pipe (14). The vapors are drawn through the trap chamber by a vacuum pump (20). The connecting pipe at the inlet of the trap chamber has a tapered diameter section (28, 30) such that its outlet is larger in diameter than its inlet. The tapered section gradually and linearly reduces the pressure from the reactor to the inlet of the trap filter chamber thereby substantially reducing particulate by-product build-up at the inlet to the trap filter caused by temperature-pressure related precipitation.

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What is claimed is:

1. A chemical vapor deposition trap, comprising:

a chamber for collecting chemical by-products, said chamber having an inlet coupled for receiving a vapor including said chemical by-products; and

a first pipe having an inlet coupled for receiving said vapor at a first pressure, said first pipe having an outlet coupled to said inlet of said chamber where said outlet of said first pipe is tapered in a concave shape to reduce said firstpressure of said vapor before entry into said chamber.

2. The chemical vapor deposition trap of claim 1 wherein said first pipe is linearly tapered.

3. The chemical vapor deposition trap of claim 2 wherein said inlet of said first pipe ranges from 1.0 inches to 3.0 inches.

4. The chemical vapor deposition trap of claim 3 wherein said outlet of said first pipe ranges from 2.0 inches to 5.0 inches.

5. The chemical vapor deposition trap of claim 4 further including:

a second pipe having a first end coupled to an outlet of said chamber; and

a vacuum pump coupled a second end of said second pipe.

6. The chemical vapor deposition trap of claim 5 further including:

a third pipe having a first end coupled to an outlet of said vacuum pump; and

a scrubber coupled a second end of said third pipe.

7. The chemical vapor deposition trap of claim 6 further including a reactor for generating said vapor and having an outlet coupled to said inlet of said first pipe.

8. A chemical vapor deposition trap, comprising:

a chamber for collecting chemical by-products, said chamber having an inlet coupled for receiving a vapor including said chemical by-products; and

a first pipe having an inlet coupled for receiving said vapor at a first pressure, said first pipe having a concave shaped tapered diameter from said inlet of said first pipe to an outlet of said first pipe that is coupled to said inlet of saidchamber where said first pipe reduces said first pressure before entry into said chamber.

9. The chemical vapor deposition trap of claim 8 wherein said first pipe is linearly tapered.

10. The chemical vapor deposition trap of claim 9 wherein said inlet of said first pipe ranges from 1.0 inches to 3.0 inches.

11. The chemical vapor deposition trap of claim 10 wherein said outlet of said first pipe ranges from 2.0 inches to 5.0 inches.

12. The chemical vapor deposition trap of claim 11 further including:

a second pipe having a first end coupled to an outlet of said chamber; and

a vacuum pump coupled a second end of said second pipe.

13. The chemical vapor deposition trap of claim 12 further including:

a third pipe having a first end coupled to an outlet of said vacuum pump; and

a scrubber coupled a second end of said third pipe.

14. The chemical vapor deposition trap of claim 13 further including a reactor for generating said vapor and having an outlet coupled to said inlet of said first pipe.